In situ Characterization of Exposed E-Beam Resist Using Novel AFM Technique
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چکیده
منابع مشابه
Electron beam lithography with feedback using in situ self-developed resist
Due to the lack of feedback, conventional electron beam lithography (EBL) is a 'blind' open-loop process where the exposed pattern is examined only after ex situ resist development, which is too late for any improvement. Here, we report that self-developing nitrocellulose resist, for which the pattern shows up right after exposure without ex situ development, can be used as in situ feedback on ...
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متن کاملElectron beam lithography on irregular surfaces using an evaporated resist.
An electron beam resist is typically applied by spin-coating, which cannot be reliably applied on nonplanar, irregular, or fragile substrates. Here we demonstrate that the popular negative electron beam resist polystyrene can be coated by thermal evaporation. A high resolution of 30 nm half-pitch was achieved using the evaporated resist. As a proof of concept of patterning on irregular surfaces...
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ژورنال
عنوان ژورنال: Microscopy and Microanalysis
سال: 2010
ISSN: 1431-9276,1435-8115
DOI: 10.1017/s1431927610058988